Other Semiconductor Materials

Thinning of Germanium Wafers
Formulated with a specialized resin bond and fine-grit diamond abrasives, this wheel delivers a gentle grinding force that prevents scratching, chip adhesion, and deformation. Achieves surface roughness Ra s 10 nm. Customizable specifications are available, suitable for processing various germanium wafers,widely used in defense, military, aerospace, and aviation industries.
Thinning of Germanium Wafers

Application Scenarios


Formulated with a specialized resin bond and fine-grit diamond abrasives, this wheel delivers a gentle grinding force that prevents scratching, chip adhesion, and deformation. Achieves surface roughness Ra s 10 nm. Customizable specifications are available, suitable for processing various germanium wafers,widely used in defense, military, aerospace, and aviation industries.


  • 1.Excellent self-sharpening and chip evacuation - resists clog-ging

  • 2.High sharpness, ensuring low stress and low impact force

  • 3.Good heat dissipation, providing low thermal damage

  • 4.Uniform abrasive distribution - no surface scratchesa

  • 5.High flatness accuracy, ensuring uniform thinning and low TTV


Model Specifications



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6A2T


Model

DT

H

XWBondGrit Size

6A2T

209

254

313

30

95

155

158

237

5

7

2

3

4.5

4

B

325

2000


Workpiece

Ge Wafer

Workpiece Size

4-Inch

Wheel Specifications

6A2T D209 (8 Inch) B 2000

Surface Quality

Uniform grinding marks, high gloss

Roughness

≤10nm

TTV

≤3μm